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Production UEIP
Appointment
Filter MKF-10 is intended for clearing of technological gases of is high-disperse aerosol particles, including the gases applied in the microelectronic industry.
The filter mkf-10
Parametres of filtrated gas
Pressure on a filter inlet, atm. (psi) - no more than 10 (143) temperature, °C - from 5 to 50.
The recommended rate of flux
To 3 nm3/ch (50 nl/mines). The peak difference of pressures in direct and return directions 6 atm. (86 psi).
Degree of clearing of gases
Not less than 99,9999999 % for particles in the size more than 0,01 mkm.
Cleanliness of gas after the filter:
Concentration of particles in the size more than 0,01 mkm - less than 0,03 particles/litres.
Concentration of the molecular impurities (water, oxygen and others) - less than 10 ppb.
Local not tightness of the case
No more than 1·10-3 l·ch mkm. mercury the item/with at interior pressure of helium (10±0,5) atm. [(143±7,1) psi] and temperature
(25±10) °C.
Applied materials
Filtrating device - nickel. The case - stainless steel, including marks 316L on request of the customer.
Processing of interior surfaces of the case
Electrochemical polishing.
Cleanliness of processing 0,63 Ra (cases from a mark steel 316L - 0,13 Ra).
The area of a filtrating surface
10 sm2.
Preparation for operation
The makingup, preparation for operation and trials in pure premises of a class 100.
Packing
Two polyethylene packages, filled with stripped air or nitrogen.
Requirements of operation of the filter:
Air temperature - from 5 to 40 °C.
Relative humidity - no more than 90 %.
Spatial orientation - any.
Reliability
Recommended periodicity of replacement or filter MKF-10 regeneration - 2 years.
The note. The gas rate of flux is specified at pressure 101,3 kPa and temperature 293,15 °K.
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